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- W2091155190 abstract "An Exitech Microstepper exposure tool has been used to laser micromachine a variety of polymeric materials with high resolution at a wavelength of 157 nm. We have demonstrated it is possible to machine thin film materials, different photoresists and fluorine-based polymers with submicron accuracy and resolution. The tool used for this work incorporated a 36x 0.5 NA Schwarzschild lens to project submicron resolution images of binary chrome-on-CaF<SUB>2</SUB> masks onto free-standing and spun-on polymer films. The beam delivery system and the illuminator includes beam shaping and homogenization optics that allow fluences of greater than 1J/cm<SUP>2</SUP> to be produced at the workpiece. Details of the optical system are presented together with process parameters and the results of the materials which have been machined." @default.
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- W2091155190 date "2001-06-29" @default.
- W2091155190 modified "2023-10-14" @default.
- W2091155190 title "<title>High-resolution 157-nm laser micromachining of polymers</title>" @default.
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- W2091155190 doi "https://doi.org/10.1117/12.432548" @default.
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