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- W2091189336 abstract "Highly sensitive dopant mapping has been demonstrated in secondary electron imaging on an InP sample prepared by low energy Ar+ ion milling for site-specific analysis. Dopant contrast as high as that of a cleaved surface was observed from the sample prepared by 1.5 keV milling. This indicates that low energy milling generates little damaged surfaces for site-specific dopant mapping. Thus, the production of semiconductors cross-sections using low energy milling can provide quick and sensitive site-specific dopant mapping, and extend the application of scanning electron microscopy (SEM) dopant mapping to the examination of nanometer-scale device structures for which site selection is essential." @default.
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- W2091189336 date "2013-12-01" @default.
- W2091189336 modified "2023-09-25" @default.
- W2091189336 title "Sensitive Site-Specific Dopant Mapping in Scanning Electron Microscopy on Specimens Prepared by Low Energy Ar+Ion Milling" @default.
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- W2091189336 doi "https://doi.org/10.7567/apex.6.126601" @default.
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