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- W2091235462 abstract "Abstract Photosensitive cycloaliphatic‐epoxy oligosiloxane was synthesized using a nonhydrolytic sol–gel reaction for the fabrication of thick and thermally stable microstructures with high aspect ratios. Its formation was confirmed by 29 Si and 1 H nuclear magnetic resonance spectroscopy, small‐angle neutron scattering, and Fourier transform infrared spectroscopy. Photocuring of cycloaliphatic‐epoxy oligosiloxane resin resulted in a thermally stable epoxy hybrid material (epoxy hybrimer). Micropatterns with a high aspect ratio (>5), an excellent sidewall shape, and low shrinkage were fabricated directly from these materials using a simple photolithographic process. The fabricated micropattern sustained temperatures of up to 250°C. © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2008" @default.
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- W2091235462 date "2008-02-29" @default.
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- W2091235462 title "Synthesis and characterization of photopatternable epoxy hybrid materials for the fabrication of thick and thermally stable microstructures with a high aspect ratio" @default.
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- W2091235462 doi "https://doi.org/10.1002/app.27966" @default.
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