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- W2091274503 abstract "We present a cheap and versatile method to fabricate antireflective moth-eye structures on various substrates. This method consists of a mask created by a self-assembly technique (block copolymer micelle nanolithography - BCML) and a subsequent reactive ion etching step. Contrary to most other methods this technique also allows for the creation of moth-eye structures on non-flat substrates. We demonstrate the superiority of this technique on a diffraction grating and on different lenses. Electron micrographs show that almost the whole surface area is homogeneously covered with these antireflective nanostructures. Transmittance and reflectance measurements support these findings." @default.
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- W2091274503 date "2011-08-01" @default.
- W2091274503 modified "2023-10-17" @default.
- W2091274503 title "Antireflective ‘moth-eye’ structures fabricated by a cheap and versatile process on various optical elements" @default.
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- W2091274503 doi "https://doi.org/10.1109/nano.2011.6144660" @default.
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