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- W2091277404 abstract "We present a systematic study of the dependence of breakdown voltages on oxide thickness d in Al–AlOx–Al thin-film capacitor structures. For sufficiently thin dielectrics, we find that a significant portion of the measured breakdown potential Vb occurs across the electrode interfaces, thereby leading to an overestimate (Vb/d) of the true breakdown electric field Eb across the dielectric. By modeling this interface contribution as an “interface” capacitance in series with the geometric “bulk” capacitance, we find for high-quality rf magnetron-sputtered AlOx dielectrics that Eb is independent of d over the range 30–300 Å." @default.
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- W2091277404 date "2003-09-15" @default.
- W2091277404 modified "2023-09-27" @default.
- W2091277404 title "Contribution of interface capacitance to the electric-field breakdown in thin-film Al–AlOx–Al capacitors" @default.
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