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- W2091286422 abstract "A method of fabricating submicron gratings for optoelectronic devices from a glass mask was proposed and demonstrated. The glass mask has gratings on both sides with a period of at least four times of the final feature size. By modifying the grating periods on the mask, one can achieve multiple-period gratings with a very fine period spacing for advanced wavelength division multiplexing (WDM) devices. In this letter, we demonstrated 0.5 μm second-order gratings for 1.55 μm distributed-feedback lasers and gratings with a 6 Å period difference for WDM laser arrays using only optical sources." @default.
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- W2091286422 date "1995-11-20" @default.
- W2091286422 modified "2023-09-23" @default.
- W2091286422 title "New grating fabrication technology for optoelectronic devices: Cascaded self-induced holography" @default.
- W2091286422 doi "https://doi.org/10.1063/1.114868" @default.
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