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- W2091508715 abstract "We report the development of an in situ real-time light scattering technique to study the wet chemical etching process of Si(100). Based on a simple scattering theory, the number of etch pits and other statistical parameters such as correlation length and interface width on a pitted surface are extracted from the scattering profile. The time evolution of the surface morphology can be interpreted by a simple rate equation." @default.
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- W2091508715 date "1996-07-08" @default.
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- W2091508715 title "<i>In</i> <i>situ</i> real-time study of chemical etching process of Si(100) using light scattering" @default.
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- W2091508715 doi "https://doi.org/10.1063/1.117378" @default.
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