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• W2091571500 abstract "Abstract Carbon nitride films were prepared using a dual ion beam assisted deposition technique with a bombardment energy of 100–500 eV. The films were characterized using Auger electron spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy for chemical analysis. A thermal activation model of nitrogen decomposition is presented, which explains the deviation of the observed N/C composition ratio from the N/C arrival ratio. An analysis of the bonding configuration indicates that the ratio of the sp 2 trigonal component to the sp 3 tetrahedral component is strongly dependent on the bombarding energy. A characteristic ion energy is deduced for the formation of tetrahedral amorphous carbon nitrides. The threshold energy enhances the rearrangement of deposited atoms and reduces decomposition of nitrogen atoms." @default.
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• W2091571500 date "2001-06-01" @default.
• W2091571500 modified "2023-09-22" @default.
• W2091571500 title "Analysis of X-ray photoelectron spectra of amorphous carbon nitride films" @default.
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• W2091571500 doi "https://doi.org/10.1016/s0040-6090(01)00848-3" @default.
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