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- W2091701990 abstract "The occupation ratio of the acceptor levels associated with the dangling bonds of a dislocation in a covalent semiconductor submitted to optical electron-hole generation is calculated thermodynamically. The same approach is also applied to the similar problem, first considered by Read, of an n-doped semiconductor. Numerical calculations for germanium at different temperatures, assuming a dislocation level 0.2 eV below the conduction band edge, show that the occupation ratio increases as the temperature is decreased. At moderate temperatures, values as high as 0.1 can be reached by reasonable injection or impurity doping, the efficiency of both methods being roughly the same.Das Besetzungsverhaltnis von Akzeptorniveaus, die mit den gestorten Bindungen einer Versetzung verknupft sind, wird fur einen kovalenten Halbleiter bei optischer Erzeugung von Elektron-Lochpaaren thermodynamisch berechnet. Die gleiche Behandlung wird auf das zuerst von Read betrachtete, ahnliche Problem eines n-leitenden Halbleiters angewendet. Numerische Berechnungen fur Germanium bei verschiedenen Temperaturen, wobei angenommen wird, das das Versetzungsniveau 0,2 eV unterhalb der Leitungsbandkante liegt, zeigen, das das Besetzungsverhaltnis mit abnehmender Temperatur zunimmt. Bei mittleren Temperaturen lassen sich Werte von etwa 0,1 bei nicht zu groser Injektion oder Dotierung erreichen, wobei die Ausbeute bei beiden Methoden nahezu die gleiche ist." @default.
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- W2091701990 date "1969-01-01" @default.
- W2091701990 modified "2023-09-27" @default.
- W2091701990 title "Electron Population of Dislocation Levels in an Illuminated Covalent Semiconductor" @default.
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- W2091701990 doi "https://doi.org/10.1002/pssb.19690320138" @default.
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