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• W2091761451 abstract "A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed." @default.
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• W2091761451 date "2011-10-26" @default.
• W2091761451 modified "2023-09-27" @default.
• W2091761451 title "Fabrication of phase masks with variable diffraction efficiency using HEBS glass technology" @default.
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• W2091761451 doi "https://doi.org/10.1364/ao.50.005977" @default.
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