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• W2091897894 abstract "In this paper, we first outline the impact of Bias Temperature Instability (BTI) on the transistor threshold voltage as a function of time and the gate oxide field. Subsequently, the correlation between time-zero and time-dependent variability is described. A combined distribution encompassing both contributions with their relative weights is derived. Finally, circuit-level insights on the BTI impact are given based on case study simulations of Ring Oscillators (ROs) at commercial-grade 28nm planar and research-grade 14, 10, 7nm FinFET technology nodes for several FET channel materials (e.g. Si, SiGe, Ge, InGaAs)." @default.
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• W2091897894 date "2014-06-01" @default.
• W2091897894 modified "2023-10-01" @default.
• W2091897894 title "Scaling of BTI reliability in presence of time-zero variability" @default.
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• W2091897894 doi "https://doi.org/10.1109/irps.2014.6861122" @default.
• W2091897894 hasPublicationYear "2014" @default.
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