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- W2091987451 abstract "One-third of a monolayer of spatially ordered boron on (111)-oriented crystalline silicon is prepared in ultrahigh vacuum and then buried under a thin layer of amorphous silicon. This leaves a two-dimensional (ensuremath{surd}3 ifmmodetimeselsetexttimesfi{} ensuremath{surd}3 ) boron layer in substitutional sites confined to a single monolayer on the crystalline side of the interface. We report electrical conductivity with a high p-type carrier density (>${10}^{14}$/${mathrm{cm}}^{2}$) in an ordered two-dimensional interface layer." @default.
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- W2091987451 date "1991-06-15" @default.
- W2091987451 modified "2023-09-24" @default.
- W2091987451 title "Electrical conduction in the Si(111):B-(√3 × √3 )<i>R</i>30°/<i>a</i>-Si interface reconstruction" @default.
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- W2091987451 doi "https://doi.org/10.1103/physrevb.43.14711" @default.
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