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- W2092127764 abstract "In this paper we report on a comprehensive study of Silicon-Germanium channel (cSiGe) physics, layout effects and impact on device performance. This work demonstrates a 2 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>nd</sup> generation of dual channel technology, which meets the 22nm high performance technology (HP) requirement. Modeling and simulation are used to optimize the process to obtain a 10% Short Channel Effect (SCE) improvement and an overall 20% performance enhancement. This 2 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>nd</sup> generation high performance dual channel process has been integrated into a manufacturable and yieldable technology, thereby providing a solid platform for introduction of SiGe FinFet technology." @default.
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- W2092127764 date "2013-12-01" @default.
- W2092127764 modified "2023-09-26" @default.
- W2092127764 title "2<sup>nd</sup> Generation dual-channel optimization with cSiGe for 22nm HP technology and beyond" @default.
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- W2092127764 doi "https://doi.org/10.1109/iedm.2013.6724594" @default.
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