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- W2092131997 abstract "This is a review of ion-implantation processes as applied to semiconductor nuclear particle detectors. The role of channeling effects in determining the distribution of implanted atoms, defects and junction characteristics is discussed. A simple method for aligning crystals “in situ” is presented. A summary is given of the anneal characteristics of lattice disorder, lattice site location of implanted atoms, and the electrical characteristics of the implanted layer. Results are presented of ion-implanted particle detector performance." @default.
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- W2092131997 title "Use of ion implantation techniques to fabricate semiconductor nuclear particle detectors" @default.
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- W2092131997 doi "https://doi.org/10.1016/0029-554x(68)90319-4" @default.
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