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• W2092173003 startingPage "138" @default.
• W2092173003 abstract "A Si thick film with a thickness of ca. 2 μm was deposited on a copper substrate by electron cyclotron resonance–chemical vapor deposition (ECR–CVD) under a mixture of silane (SiH4) and argon (Ar) gases. The surface modification of the silicon anode was carried out by the metal-assisted chemical etching method. Observation by SEM showed that the silicon on the copper substrate had a nanorod structure as the result of the etching process. The electrochemical performance of the anode prepared using the free-standing Si nanorods showed a specific capacity of more than 2000 mAh/g with 84% of the discharge capacity remaining ever after 25 cycles of charge and discharge, as compared with 35% of the discharge capacity remaining for the pristine Si thick film." @default.
• W2092173003 created "2016-06-24" @default.
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• W2092173003 creator A5044812217 @default.
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• W2092173003 date "2012-01-01" @default.
• W2092173003 modified "2023-09-27" @default.
• W2092173003 title "Free-standing silicon nanorods on copper foil as anode for lithium-ion batteries" @default.
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• W2092173003 doi "https://doi.org/10.1016/j.mee.2011.03.142" @default.
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