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• W2092225494 abstract "A unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si‐YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser direct‐write etching. Multilayered YBaCuO thin films were then deposited by e‐beam evaporation and annealed in a rapid thermal annealing system for 30–90 s at 980 °C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Si‐YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10‐μm‐wide, 1‐mm‐long and 2.5‐μm‐wide, 80‐μm‐long lines, the Tc was observed above 76 K. The critical current density of the lines was measured to be 300 A/cm2 at 75 K. This patterning technique may be useful for fabrication of high Tc superconducting interconnects and devices." @default.
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• W2092225494 date "1989-08-28" @default.
• W2092225494 modified "2023-09-27" @default.
• W2092225494 title "Novel method of patterning YBaCuO superconducting thin films" @default.
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• W2092225494 doi "https://doi.org/10.1063/1.102448" @default.
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