Matches in SemOpenAlex for { <https://semopenalex.org/work/W2092304284> ?p ?o ?g. }
Showing items 1 to 96 of
96
with 100 items per page.
- W2092304284 endingPage "2122" @default.
- W2092304284 startingPage "2122" @default.
- W2092304284 abstract "Maintaining dimensional control and adequate throughput during the etching of submicron features requires plasma etch tools that operate at low pressures and high densities, such as inductively coupled plasmas (ICPs). Unfortunately, in this regime, it has proven difficult to achieve a stable, reproducible chemistry for selective oxide etching of contacts and vias. In particular, it is difficult to control the passivating polymer film which provides etching selectivity to silicon, nitride, and photoresist. As a first step toward sorting out the complicated oxide etching chemistry, we have measured and modeled the kinetics of the polymer film deposition in an ICP reactor for C2F6/H2 and CHF3 chemistries. Using a unique application of statistical design of experiments, we have explored the pressure range of 3–15 mTorr, power range of 300–2000 W, residence times from 0.5 to 1.0 s, and magnetic field from 0 to 24 G. Polymer deposition rates on a bare Si wafer are measured using a laser interferometer. The concentration of fluorocarbon radicals, CF, CF2, and CF3, are measured in the plasma using wavelength modulated infrared diode laser absorption spectroscopy. Additional measurements include actinometric F atom density and ion saturation current. These measurements are analyzed in terms of a polymer deposition model and the important physical phenomena are inferred. Significantly, we find a unique polymer deposition mechanism over the entire range of tool parameters including direct deposition of CF and ion-assisted deposition of CF2." @default.
- W2092304284 created "2016-06-24" @default.
- W2092304284 creator A5036204483 @default.
- W2092304284 creator A5046178916 @default.
- W2092304284 creator A5060575563 @default.
- W2092304284 creator A5066145404 @default.
- W2092304284 date "2000-01-01" @default.
- W2092304284 modified "2023-09-26" @default.
- W2092304284 title "Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor" @default.
- W2092304284 cites W1616717154 @default.
- W2092304284 cites W1964954334 @default.
- W2092304284 cites W1972840313 @default.
- W2092304284 cites W1986914212 @default.
- W2092304284 cites W1990345488 @default.
- W2092304284 cites W2007824331 @default.
- W2092304284 cites W2019212619 @default.
- W2092304284 cites W2023553132 @default.
- W2092304284 cites W2032731497 @default.
- W2092304284 cites W2040053568 @default.
- W2092304284 cites W2073456241 @default.
- W2092304284 cites W2092814893 @default.
- W2092304284 cites W2094427838 @default.
- W2092304284 cites W4238352284 @default.
- W2092304284 doi "https://doi.org/10.1116/1.1286396" @default.
- W2092304284 hasPublicationYear "2000" @default.
- W2092304284 type Work @default.
- W2092304284 sameAs 2092304284 @default.
- W2092304284 citedByCount "41" @default.
- W2092304284 countsByYear W20923042842015 @default.
- W2092304284 countsByYear W20923042842016 @default.
- W2092304284 countsByYear W20923042842017 @default.
- W2092304284 countsByYear W20923042842018 @default.
- W2092304284 crossrefType "journal-article" @default.
- W2092304284 hasAuthorship W2092304284A5036204483 @default.
- W2092304284 hasAuthorship W2092304284A5046178916 @default.
- W2092304284 hasAuthorship W2092304284A5060575563 @default.
- W2092304284 hasAuthorship W2092304284A5066145404 @default.
- W2092304284 hasConcept C100460472 @default.
- W2092304284 hasConcept C107187091 @default.
- W2092304284 hasConcept C113196181 @default.
- W2092304284 hasConcept C121332964 @default.
- W2092304284 hasConcept C151730666 @default.
- W2092304284 hasConcept C160671074 @default.
- W2092304284 hasConcept C171250308 @default.
- W2092304284 hasConcept C178790620 @default.
- W2092304284 hasConcept C185592680 @default.
- W2092304284 hasConcept C192562407 @default.
- W2092304284 hasConcept C2779227376 @default.
- W2092304284 hasConcept C2816523 @default.
- W2092304284 hasConcept C49040817 @default.
- W2092304284 hasConcept C521977710 @default.
- W2092304284 hasConcept C62520636 @default.
- W2092304284 hasConcept C64297162 @default.
- W2092304284 hasConcept C82706917 @default.
- W2092304284 hasConcept C86803240 @default.
- W2092304284 hasConcept C95974651 @default.
- W2092304284 hasConceptScore W2092304284C100460472 @default.
- W2092304284 hasConceptScore W2092304284C107187091 @default.
- W2092304284 hasConceptScore W2092304284C113196181 @default.
- W2092304284 hasConceptScore W2092304284C121332964 @default.
- W2092304284 hasConceptScore W2092304284C151730666 @default.
- W2092304284 hasConceptScore W2092304284C160671074 @default.
- W2092304284 hasConceptScore W2092304284C171250308 @default.
- W2092304284 hasConceptScore W2092304284C178790620 @default.
- W2092304284 hasConceptScore W2092304284C185592680 @default.
- W2092304284 hasConceptScore W2092304284C192562407 @default.
- W2092304284 hasConceptScore W2092304284C2779227376 @default.
- W2092304284 hasConceptScore W2092304284C2816523 @default.
- W2092304284 hasConceptScore W2092304284C49040817 @default.
- W2092304284 hasConceptScore W2092304284C521977710 @default.
- W2092304284 hasConceptScore W2092304284C62520636 @default.
- W2092304284 hasConceptScore W2092304284C64297162 @default.
- W2092304284 hasConceptScore W2092304284C82706917 @default.
- W2092304284 hasConceptScore W2092304284C86803240 @default.
- W2092304284 hasConceptScore W2092304284C95974651 @default.
- W2092304284 hasIssue "5" @default.
- W2092304284 hasLocation W20923042841 @default.
- W2092304284 hasOpenAccess W2092304284 @default.
- W2092304284 hasPrimaryLocation W20923042841 @default.
- W2092304284 hasRelatedWork W1544774047 @default.
- W2092304284 hasRelatedWork W1986965160 @default.
- W2092304284 hasRelatedWork W1992219747 @default.
- W2092304284 hasRelatedWork W2055931842 @default.
- W2092304284 hasRelatedWork W2059112004 @default.
- W2092304284 hasRelatedWork W2065108417 @default.
- W2092304284 hasRelatedWork W2161140643 @default.
- W2092304284 hasRelatedWork W2164353131 @default.
- W2092304284 hasRelatedWork W2921533508 @default.
- W2092304284 hasRelatedWork W65767922 @default.
- W2092304284 hasVolume "18" @default.
- W2092304284 isParatext "false" @default.
- W2092304284 isRetracted "false" @default.
- W2092304284 magId "2092304284" @default.
- W2092304284 workType "article" @default.