Matches in SemOpenAlex for { <https://semopenalex.org/work/W2092435384> ?p ?o ?g. }
Showing items 1 to 86 of
86
with 100 items per page.
- W2092435384 abstract "For obvious cost reasons, semiconductor manufacturers are constantly striving to produce ever smaller wafer geometries with the current installed base of wafer steppers. Many techniques (phase shifting, optical proximity correction, etc.) have been used successfully to 'squeeze' more resolution from these steppers than was once thought possible. Wafers processed using non-aggressive k<SUB>1</SUB> factors provided a linear correlation between mask and wafer feature sizes. However, it has been shown that pushing k<SUB>1</SUB> factors to very low levels causes a nonlinear response between changes in photomask and wafer critical dimension. This non-linearity demands extremely tight photomask CD control specifications. Total CD errors 50 nm and smaller can cause unacceptable wafer CD variation. Current high end reticle manufacturers are capable of meeting a total CD uniformity specification of approximately 40 nm as measured by sampling strategies using optical metrology tools. These tools are very useful for detecting macro changes in CD; however, they will only detect a localized error if it happens to occur precisely at the point of measurement. In contrast, a pattern inspection system employing a linewidth measurement algorithm can ensure detection of all localized errors within the detection and review capability of the system. The problem with reticle CD error detection capability is that there is a large discrepancy between currently available detection of greater than or equal to 150 nm and required detection of less than or equal to 50 nm necessary for proper wafer functionality at low k<SUB>1</SUB> lithography. In this paper, defect sensitivity and false detection performance of a new advanced line measurement algorithm was tested. The test vehicles included both an industry standard and a custom designed programmed defect test mask. In addition, production masks with naturally occurring localized CD errors that caused wafer pattern bridging were analyzed. This new experimental algorithm has shown localized CD error detection of less than or equal to 100 nm reticle defects." @default.
- W2092435384 created "2016-06-24" @default.
- W2092435384 creator A5007535133 @default.
- W2092435384 creator A5034759347 @default.
- W2092435384 creator A5069380881 @default.
- W2092435384 date "1998-06-29" @default.
- W2092435384 modified "2023-09-26" @default.
- W2092435384 title "Killer defects caused by localized sub-100-nm critical dimension reticle errors" @default.
- W2092435384 doi "https://doi.org/10.1117/12.310795" @default.
- W2092435384 hasPublicationYear "1998" @default.
- W2092435384 type Work @default.
- W2092435384 sameAs 2092435384 @default.
- W2092435384 citedByCount "0" @default.
- W2092435384 crossrefType "proceedings-article" @default.
- W2092435384 hasAuthorship W2092435384A5007535133 @default.
- W2092435384 hasAuthorship W2092435384A5034759347 @default.
- W2092435384 hasAuthorship W2092435384A5069380881 @default.
- W2092435384 hasConcept C105487726 @default.
- W2092435384 hasConcept C120665830 @default.
- W2092435384 hasConcept C121332964 @default.
- W2092435384 hasConcept C127413603 @default.
- W2092435384 hasConcept C138885662 @default.
- W2092435384 hasConcept C142181693 @default.
- W2092435384 hasConcept C146617872 @default.
- W2092435384 hasConcept C14737013 @default.
- W2092435384 hasConcept C160671074 @default.
- W2092435384 hasConcept C171250308 @default.
- W2092435384 hasConcept C192562407 @default.
- W2092435384 hasConcept C195766429 @default.
- W2092435384 hasConcept C202444582 @default.
- W2092435384 hasConcept C204223013 @default.
- W2092435384 hasConcept C207789793 @default.
- W2092435384 hasConcept C24326235 @default.
- W2092435384 hasConcept C2776401178 @default.
- W2092435384 hasConcept C2779227376 @default.
- W2092435384 hasConcept C33676613 @default.
- W2092435384 hasConcept C33923547 @default.
- W2092435384 hasConcept C41008148 @default.
- W2092435384 hasConcept C41895202 @default.
- W2092435384 hasConcept C49040817 @default.
- W2092435384 hasConcept C520434653 @default.
- W2092435384 hasConcept C53524968 @default.
- W2092435384 hasConcept C78371743 @default.
- W2092435384 hasConceptScore W2092435384C105487726 @default.
- W2092435384 hasConceptScore W2092435384C120665830 @default.
- W2092435384 hasConceptScore W2092435384C121332964 @default.
- W2092435384 hasConceptScore W2092435384C127413603 @default.
- W2092435384 hasConceptScore W2092435384C138885662 @default.
- W2092435384 hasConceptScore W2092435384C142181693 @default.
- W2092435384 hasConceptScore W2092435384C146617872 @default.
- W2092435384 hasConceptScore W2092435384C14737013 @default.
- W2092435384 hasConceptScore W2092435384C160671074 @default.
- W2092435384 hasConceptScore W2092435384C171250308 @default.
- W2092435384 hasConceptScore W2092435384C192562407 @default.
- W2092435384 hasConceptScore W2092435384C195766429 @default.
- W2092435384 hasConceptScore W2092435384C202444582 @default.
- W2092435384 hasConceptScore W2092435384C204223013 @default.
- W2092435384 hasConceptScore W2092435384C207789793 @default.
- W2092435384 hasConceptScore W2092435384C24326235 @default.
- W2092435384 hasConceptScore W2092435384C2776401178 @default.
- W2092435384 hasConceptScore W2092435384C2779227376 @default.
- W2092435384 hasConceptScore W2092435384C33676613 @default.
- W2092435384 hasConceptScore W2092435384C33923547 @default.
- W2092435384 hasConceptScore W2092435384C41008148 @default.
- W2092435384 hasConceptScore W2092435384C41895202 @default.
- W2092435384 hasConceptScore W2092435384C49040817 @default.
- W2092435384 hasConceptScore W2092435384C520434653 @default.
- W2092435384 hasConceptScore W2092435384C53524968 @default.
- W2092435384 hasConceptScore W2092435384C78371743 @default.
- W2092435384 hasLocation W20924353841 @default.
- W2092435384 hasOpenAccess W2092435384 @default.
- W2092435384 hasPrimaryLocation W20924353841 @default.
- W2092435384 hasRelatedWork W1967508201 @default.
- W2092435384 hasRelatedWork W1968817737 @default.
- W2092435384 hasRelatedWork W1986705012 @default.
- W2092435384 hasRelatedWork W1989062007 @default.
- W2092435384 hasRelatedWork W2005152660 @default.
- W2092435384 hasRelatedWork W2030106306 @default.
- W2092435384 hasRelatedWork W2073728321 @default.
- W2092435384 hasRelatedWork W3173419540 @default.
- W2092435384 hasRelatedWork W4281622355 @default.
- W2092435384 hasRelatedWork W2513744442 @default.
- W2092435384 isParatext "false" @default.
- W2092435384 isRetracted "false" @default.
- W2092435384 magId "2092435384" @default.
- W2092435384 workType "article" @default.