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- W2092477881 abstract "Wurtzite AlBN thin films were fabricated using flow-rate modulation epitaxy (FME), wherein group-III and group-V sources are alternatively supplied to the growing surface. A 350-nm-thick wurtzite Al1−xBxN (x∼0.015) film grown by FME exhibited a single sharp peak in the ω-2θ scan of x-ray diffraction, a smooth surface with the root-mean-square roughness of 3.4nm, and a sharp epitaxial interface with SiC(0001) substrate, whereas that prepared by conventional metalorganic chemical vapor deposition contained faceted columnar AlBN(11̱01) crystallites several ten nanometers in width in an AlBN(0001) matrix. FME is useful for fabricating high-quality wurtzite AlBN thin films, because it suppresses polycrystallization through enhancement of the surface migration of boron atoms." @default.
- W2092477881 created "2016-06-24" @default.
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- W2092477881 date "2006-01-23" @default.
- W2092477881 modified "2023-09-26" @default.
- W2092477881 title "Flow-rate modulation epitaxy of wurtzite AlBN" @default.
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- W2092477881 doi "https://doi.org/10.1063/1.2164900" @default.
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