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- W2092552557 abstract "To obtain reproducible results with the silylation technique of acid hardened resist in electron beam lithography it is indispensable to measure the thickness of the silylated resist layer in-situ during the silylation process. Measurement of the conditions to couple evanescent light into waveguide modes of the silylated resist allows one to determine the silylated thickness with high sensitivity and resolution." @default.
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- W2092552557 date "1993-04-01" @default.
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- W2092552557 title "Endpoint detection for silylation processes with waveguide modes" @default.
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- W2092552557 doi "https://doi.org/10.1016/0167-9317(93)90063-b" @default.
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