Matches in SemOpenAlex for { <https://semopenalex.org/work/W2092748923> ?p ?o ?g. }
Showing items 1 to 82 of
82
with 100 items per page.
- W2092748923 endingPage "73" @default.
- W2092748923 startingPage "55" @default.
- W2092748923 abstract "In this paper we analyze the technological accumulation processes in the Korean semiconductor industry from the institutional approach. Institutional approach, which is closely connected with Neo-Schumpeterian tradition, has emerged as an alternative theoretical framework to neoclassical approach to understand the process of producing technological knowledge. Traditional wisdom of neoclassical approach revealed the limitation to explain the complex nature of knowledge creation and diffusion. US patent data are analyzed in terms of the increasing trend of numbers and its content to measure the rate and direction of technological capability accumulation. This analysis shows that semiconductor technologies are one of the fastest growing fields among Korean technological activities. Moreover, the analysis of patent content suggests that fabrication technologies are the most important area within the technological development of semiconductors, whilst circuit design and testing technologies are beginning to increase in significance. In addition, it is examined how private sectors and public institutions have contributed to generate technological capabilities, and the relationship between them has been changed during the development processes. It is found that Korean firms enhanced their technological capabilities from the learning and assimilation of imported technology to enhanced in-house R&D capabilities in the later stage. The support of public institution and government policy also played significant role to this successful transformation in conjunction with the vigorous R&D investment of public sector." @default.
- W2092748923 created "2016-06-24" @default.
- W2092748923 creator A5041460510 @default.
- W2092748923 creator A5052417558 @default.
- W2092748923 creator A5065823491 @default.
- W2092748923 date "1998-03-01" @default.
- W2092748923 modified "2023-09-26" @default.
- W2092748923 title "The Sources and Directions of Technological Capability Accumulation in the Korean Semiconductor Industry" @default.
- W2092748923 cites W1975737772 @default.
- W2092748923 cites W2027662789 @default.
- W2092748923 cites W2090363517 @default.
- W2092748923 doi "https://doi.org/10.4218/etrij.98.0198.0106" @default.
- W2092748923 hasPublicationYear "1998" @default.
- W2092748923 type Work @default.
- W2092748923 sameAs 2092748923 @default.
- W2092748923 citedByCount "4" @default.
- W2092748923 countsByYear W20927489232015 @default.
- W2092748923 crossrefType "journal-article" @default.
- W2092748923 hasAuthorship W2092748923A5041460510 @default.
- W2092748923 hasAuthorship W2092748923A5052417558 @default.
- W2092748923 hasAuthorship W2092748923A5065823491 @default.
- W2092748923 hasConcept C108225325 @default.
- W2092748923 hasConcept C111919701 @default.
- W2092748923 hasConcept C117671659 @default.
- W2092748923 hasConcept C119599485 @default.
- W2092748923 hasConcept C127413603 @default.
- W2092748923 hasConcept C137996800 @default.
- W2092748923 hasConcept C138885662 @default.
- W2092748923 hasConcept C139719470 @default.
- W2092748923 hasConcept C144133560 @default.
- W2092748923 hasConcept C162324750 @default.
- W2092748923 hasConcept C17744445 @default.
- W2092748923 hasConcept C199539241 @default.
- W2092748923 hasConcept C27548731 @default.
- W2092748923 hasConcept C2778137410 @default.
- W2092748923 hasConcept C2987888538 @default.
- W2092748923 hasConcept C40700 @default.
- W2092748923 hasConcept C41008148 @default.
- W2092748923 hasConcept C41895202 @default.
- W2092748923 hasConcept C94625758 @default.
- W2092748923 hasConcept C98045186 @default.
- W2092748923 hasConceptScore W2092748923C108225325 @default.
- W2092748923 hasConceptScore W2092748923C111919701 @default.
- W2092748923 hasConceptScore W2092748923C117671659 @default.
- W2092748923 hasConceptScore W2092748923C119599485 @default.
- W2092748923 hasConceptScore W2092748923C127413603 @default.
- W2092748923 hasConceptScore W2092748923C137996800 @default.
- W2092748923 hasConceptScore W2092748923C138885662 @default.
- W2092748923 hasConceptScore W2092748923C139719470 @default.
- W2092748923 hasConceptScore W2092748923C144133560 @default.
- W2092748923 hasConceptScore W2092748923C162324750 @default.
- W2092748923 hasConceptScore W2092748923C17744445 @default.
- W2092748923 hasConceptScore W2092748923C199539241 @default.
- W2092748923 hasConceptScore W2092748923C27548731 @default.
- W2092748923 hasConceptScore W2092748923C2778137410 @default.
- W2092748923 hasConceptScore W2092748923C2987888538 @default.
- W2092748923 hasConceptScore W2092748923C40700 @default.
- W2092748923 hasConceptScore W2092748923C41008148 @default.
- W2092748923 hasConceptScore W2092748923C41895202 @default.
- W2092748923 hasConceptScore W2092748923C94625758 @default.
- W2092748923 hasConceptScore W2092748923C98045186 @default.
- W2092748923 hasIssue "1" @default.
- W2092748923 hasLocation W20927489231 @default.
- W2092748923 hasOpenAccess W2092748923 @default.
- W2092748923 hasPrimaryLocation W20927489231 @default.
- W2092748923 hasRelatedWork W1562224751 @default.
- W2092748923 hasRelatedWork W2080209520 @default.
- W2092748923 hasRelatedWork W2082263623 @default.
- W2092748923 hasRelatedWork W2349892012 @default.
- W2092748923 hasRelatedWork W2361341476 @default.
- W2092748923 hasRelatedWork W2368809138 @default.
- W2092748923 hasRelatedWork W2373507341 @default.
- W2092748923 hasRelatedWork W2375111304 @default.
- W2092748923 hasRelatedWork W3125158006 @default.
- W2092748923 hasRelatedWork W3126116745 @default.
- W2092748923 hasVolume "20" @default.
- W2092748923 isParatext "false" @default.
- W2092748923 isRetracted "false" @default.
- W2092748923 magId "2092748923" @default.
- W2092748923 workType "article" @default.