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• W2093224622 startingPage "16549" @default.
• W2093224622 abstract "We have investigated the low-temperature conductivity and magnetoresistance of amorphous ${mathrm{Si}}_{1mathrm{ensuremath{-}}mathit{x}}$${mathrm{Mn}}_{mathit{x}}$ films on the insulating side of the metal-insulator transition after annealing at room temperature for eight years. As temperature is reduced, we find a crossover from an exp[-(${mathit{T}}_{0}$/T${)}^{1/2}$] form for variable-range-hopping conduction in a Coulomb gap to a simply activated law, exp(-ensuremath{Delta}E/kT). Application of a magnetic field results in a linear decrease of the activation energy ensuremath{Delta}E. This behavior is attributed to the presence of a ``hard'' magnetic gap caused by the s-d exchange interaction between the hopping electrons and localized spins on clusters of Mn atoms with the formation of magnetic polarons." @default.
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• W2093224622 date "1995-06-15" @default.
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• W2093224622 title "Magnetic correlations on the insulating side of the metal-insulator transition in amorphous<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant=normal>Si</mml:mi></mml:mrow><mml:mrow><mml:mn>1</mml:mn><mml:mi mathvariant=normal>−</mml:mi><mml:mi mathvariant=italic>x</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math><mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:msub><mml:mrow…" @default.
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• W2093224622 doi "https://doi.org/10.1103/physrevb.51.16549" @default.
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