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- W2093276489 abstract "Abstract The effects of substrate temperature ( T sub ) of Si(1 0 0) on the orientation of hexagonal Boron Nitride (h-BN) films synthesized using magnetron sputtering and Plasma-Enhanced CVD (PECVD) were studied, respectively. It was observed that higher T sub could result in the growth of (0 0 0 2) oriented h-BN films and improve the crystallinity of the films, in contrast the films with the c -axis basically parallel to the surface at lower ones. A tentative explanation on the mechanism of the orientation characteristic is suggested, under the integration of compressive stress due to ion bombardment and desorption from thermal excitation." @default.
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- W2093276489 date "2002-05-01" @default.
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- W2093276489 title "Dependence of oriented BN films on Si(100) substrate temperature" @default.
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- W2093276489 doi "https://doi.org/10.1016/s0022-0248(02)01240-x" @default.
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