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• W2093337355 abstract "A few heavily substituted metal sulfides have been predicted to form intermediate band (IB) materials. While early experiments with powdered material have shown great promise, a synthetic approach to thin film growth is lacking. Here we report an atomic layer deposition (ALD) approach to fabricate V <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.25</sub> In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>1.75</sub> S <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> IB thin films with the potential for unique alloying control. Many commercial indium and vanadium precursors were explored, but their surface chemistries were unsatisfactory with H <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> S. Instead, a novel indium (III) amidinate precursor enables the growth of largely impurity-free In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> S <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> films. Thin films with promising optoelectronic properties have been tested and characterized. Additionally, vanadium alloying has commenced using a novel vanadium(III) amidinate precursor, and the first evidence of sub-band gap absorption has been observed." @default.
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• W2093337355 date "2014-06-01" @default.
• W2093337355 modified "2023-09-25" @default.
• W2093337355 title "Chemical and spatial control of substitutional intermediate band materials: Toward the atomic layer deposition of V<inf>0.25</inf>In<inf>1.75</inf>SP<inf>3</inf>" @default.
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• W2093337355 doi "https://doi.org/10.1109/pvsc.2014.6925683" @default.
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