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- W2093443357 abstract "The Center for Nanotechnology has developed an advanced beamline dedicated to nanopatterning using the radiation from a new undulator on the Aladdin storage ring at the Synchrotron Radiation Center of the University of Wisconsin-Madison. Computer generated holograms and transmission interferometric gratings were fabricated and tested on the new extreme ultraviolet (EUV) exposure system. The authors have developed an accurate model, based on Fresnel-Kirchhoff integral diffraction theory, to analyze performance of real EUV interferometric and holographic lithography systems." @default.
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- W2093443357 date "2007-11-01" @default.
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- W2093443357 title "Progress in extreme ultraviolet interferometric and holographic lithography" @default.
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- W2093443357 doi "https://doi.org/10.1116/1.2794069" @default.
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