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- W2093472005 abstract "The N2O-rapid thermal processing (RTP) of (100) silicon and of SiO2 at 1150 °C for 30, 100, and 300 s leads to a constant nitrogen maximum content in an interlayer between SiO2 and Si with the consequence of decreasing nitrogen content at surface and in bulk with process time. If 10–10 000 vpm H2 is added to N2O during RTP the nitrogen incorporation remains generally unchanged. The nitrogen should be incorporated from the NOx species dissociated at the interface with favoring the Si–O binding. The nitrogen compensates defective sites near the interface and in the bulk also in the presence of hydrogen." @default.
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- W2093472005 title "Nitrogen incorporation in SiO2 by rapid thermal processing of silicon and SiO2 in N2O" @default.
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- W2093472005 doi "https://doi.org/10.1063/1.108995" @default.
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