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- W2093774117 abstract "The quantum mechanical interference method to extract oxide thickness is examined in detail by fully using the least square fit technique. The current density, J0, that corresponds to oscillatory peaks of n=1,2,3 and 4 is plotted against n, and by doing so, data scattering among the devices is clearly recognized. The extracted physical parameters, ΦM and m2, have large standard deviation around the average depending on device and polarity conditions. Despite the scattering, an apparent success of the quantum interference (QI) analysis is obtained when the averaged parameters, ΦM=2.94 eV and m2/m0=0.54, are used. It is discussed that both ΦM and m2 are equally critical to the accuracy of the QI method, and they luckily deviate in the opposite direction around the average to cancel with each other. An essential limitation of the QI method is that the device characteristics depend on the factor (tOX√ΦM) and we cannot decide ΦM and tOX separately. tOX to extract ΦM and m2 must be evaluated by the help of other technique like ellipsometry or C–V measurements." @default.
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- W2093774117 date "2001-01-01" @default.
- W2093774117 modified "2023-10-02" @default.
- W2093774117 title "Physical parameters of the quantum mechanical interference method for the determination of oxide thickness in MOS devices" @default.
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- W2093774117 doi "https://doi.org/10.1016/s0038-1101(00)00222-7" @default.
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