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• W2093798772 abstract "Thin encapsulated silver films have been prepared on oxidized silicon by nitridation of ∼200-nm-thick Ag–19 at. % Ti alloy films and Ag(120 nm)/Ti(22 nm) at 300–700 °C in an ammonia ambient. The encapsulation process has been studied in detail by Rutherford backscattering, and scanning Auger and secondary-ion-mass spectrometry, which showed that Ti-nitride and Ti-oxide-silicide formation take place at the surface and the Ag–Ti/SiO2 interface, respectively. Four-point-probe analysis of the alloy films suggests that the resistivity is controlled by the residual Ti concentration. Resistivity values of ∼4 μΩ cm were measured in encapsulated Ag alloy films with initial low Ti concentrations. The annealed bilayer structure had minimal Ti accumulations in Ag and the resistivity values were comparable to that of the as-deposited Ag (∼3 μΩ cm)." @default.
• W2093798772 created "2016-06-24" @default.
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• W2093798772 date "1996-06-03" @default.
• W2093798772 modified "2023-10-14" @default.
• W2093798772 title "Encapsulation of Ag films on SiO2 by Ti reactions using Ag–Ti alloy/bilayer structures and an NH3 ambient" @default.
• W2093798772 cites W1485283179 @default.
• W2093798772 cites W2056722718 @default.
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• W2093798772 doi "https://doi.org/10.1063/1.116564" @default.
• W2093798772 hasPublicationYear "1996" @default.
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