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- W2093871462 abstract "Abstract The interaction of fluorine atoms and ions with hydrogen-terminated Si(111) thin film has been studied using periodic ab initio electronic structure calculations. Penetration of fluorine atoms into the Si surface is found to be quite easy, and an interstitial fluorine atom can be situated directly behind the SiH bond while the original lattice structure, as well as the SiH bond itself, remains intact. The fluorine atom in this position is negatively charged by accumulating electron charges from the nearest silicon atoms. The penetration reaction of the fluorine ions into the Si surface is also found to be easy." @default.
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- W2093871462 date "2000-10-01" @default.
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- W2093871462 title "Theoretical study of penetration reaction of fluorine atoms and ions into hydrogen-terminated Si(111) thin film" @default.
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