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• W2093895087 abstract "In this paper we report on the composition of silicon dioxides of 32 nm thickness thermally nitrided in a lamp heated furnace. The oxides were thermally nitrided in a lamp heated furnace for 10, 30 and 60 s at temperatures of 950, 1000, 1050, 1100 and 1150°C. The composition of the films was determined with elastic recoil detection using a 30 MeV 28Si5+ beam incident at 30° with the surface of the sample. The concentration of hydrogen in the films was found to be essentially independent of the nitridation time and temperature at a value of 3×1015 atoms cm−2, while the nitrogen content of the films increases with both from 1.0×1015 atoms cm−2 after 10 s at 950°C up to 9.8×1015 atoms cm−2 after 60 s at 1150°C. From the temperature dependence of the amount of nitrogen in the films an activation energy of 1.10±0.06 eV was deduced. Nitrogen in these films is incorporated as a result of in-diffusion of NHx species and the subsequent insertion in the amorphous network. As the amount of nitrogen incorporated is believed to be too low to form a significant diffusion barrier, we suggest the measured activation energy to be associated with the insertion reactions." @default.
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• W2093895087 date "1989-10-01" @default.
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• W2093895087 title "Rapid thermal nitridation of SiO2 films" @default.
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• W2093895087 doi "https://doi.org/10.1016/0169-4332(89)90436-4" @default.
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