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- W2094118567 abstract "A quantitative knowledge of the energy deposited by low-energy electron beams is often necessary for microelectronic applications. Three calculations of energy deposition in a metal-oxide-semiconductor (MOS) structure irradiated by a beam of 20- keV electrons are compared in this note. The error resulting from equating electron penetration to path length is illustrated." @default.
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- W2094118567 date "1975-04-01" @default.
- W2094118567 modified "2023-09-27" @default.
- W2094118567 title "Comment on low-energy electron-beam energy deposition" @default.
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- W2094118567 doi "https://doi.org/10.1109/t-ed.1975.18106" @default.
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