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• W2094128045 startingPage "202" @default.
• W2094128045 abstract "The lattice strain induced by the diffusion of phosphorus or boron in the (111) surface of silicon was studied by means of the intensity measurement of X-ray diffraction. In specimens with surface concentrations of phosphorus 6×10 19 to 1.5×10 21 cm -3 or boron 6×10 18 to 1.2×10 20 cm -3 , the diffusion-induced strains were observed to extend in the range of 350∼700µ from the surface. The lattice strain at distance D from the surface can be expressed by ε=ε 0 exp (-α D ), where ε 0 is the maximum strain induced by the diffusion and depends on the surface impurity concentration and α is a constant of about 100 cm -1 for specimens with large dimension, ≥1 mm in thickness." @default.
• W2094128045 created "2016-06-24" @default.
• W2094128045 creator A5063423983 @default.
• W2094128045 date "1975-01-15" @default.
• W2094128045 modified "2023-10-16" @default.
• W2094128045 title "X-Ray Measurement of Lattice Strain Induced by Impurity Diffusion" @default.
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• W2094128045 doi "https://doi.org/10.1143/jpsj.38.202" @default.
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