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- W2094362213 abstract "Abstract The crystallinity of AlN films on silicon substrates grown by organometallic chemical vapour deposition was investigated using X-ray diffraction and reflection high energy electron diffraction (RHEED). Single-crystal films of good quality with atomically smooth surfaces can be epitaxially grown on Si(111) substrates. Epitaxial films can also be grown on Si(001) substrates. These films have previously been reported to have a fibre structure. Different RHEED patterns were observed from the films on Si(111) and Si(001). It is established that the films grown on Si(001) consist of two types of crystallite with the following orientations: [11 2 0]AlN//[110]Si and [11 2 0]AlN//[1 1 0]Si The thickness dependence of the crystallinity was also investigated. The standard deviation σ of the X-ray rocking curve for the films grown on Si(111) is less than that for the films on Si(001) and is independent of the film thickness. The σ values for the films on Si(001) decrease markedly with increasing film thickness. On the basis of these observations, the growth mechanism of AlN epitaxial films on Si(111) and Si(001) is discussed." @default.
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- W2094362213 date "1984-12-01" @default.
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- W2094362213 title "Reflection high energy electron diffraction and X-ray studies of AlN films grown on Si(111) and Si(001) by organometallic chemical vapour deposition" @default.
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- W2094362213 doi "https://doi.org/10.1016/0040-6090(84)90052-x" @default.
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