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- W2094517903 abstract "Two methods are presented to realize a low forward-voltage p-i-n diode with a thin i region. One is to increase recombination current by appropriately controlling carrier lifetime in the i region. The recombination current for a constant voltage reaches a maximum at a carrier lifetime given by <tex xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>(q/kT) Wmin{i}max{2}/8mu_{i}</tex> , where W <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>i</inf> and μ <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>i</inf> are thickness and effective mobility of the i region, respectively. The other is to increase diffusion current in the p emitter by decreasing carrier lifetime only for the high impurity concentration region. On the basis of the first method, diodes with a 0.83-V forward voltage at 150 A/cm <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sup> , a 200-V reverse voltage, and a 50-ns reverse recovery time were obtained." @default.
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- W2094517903 date "1981-03-01" @default.
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- W2094517903 title "Computer-aided design consideration on low-loss p-i-n diodes" @default.
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- W2094517903 doi "https://doi.org/10.1109/t-ed.1981.20319" @default.
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