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- W2094604249 abstract "A 20× Schwarzschild projection optics (PO) designed for principle experiment of interferometry for extreme ultravioletlithography (EUVL) is assembled and aligned utilizing a Fizeau-type interferometer. The design goal of the PO is toachieve a wavefront error (WFE) of less than 30mλ rms (λ = 632.8nm ) in an image side field diameter of 0.2mm. Thispaper presents the detailed design, assembly and alignment procedure of the PO. The PO is designed at 13.4nmwavelength for future EUV at-wavelength experiment and the original design could achieve a resolution of 100nm withina depth of focus of 75nm. Due to fabrication errors, the fabricated PO could only achieve a WFEof 28mλ rms (λ = 632.8nm ) simulated by CODE V in ideal alignment status. Tolerance analysis is performed by CODEV to determine the requirement of assembly mechanism and the tolerance of coarse alignment. In the coarse alignmentprocess, a simple method based on the precise positioning of the curvature center of each mirror in Schwarzschild PO isused. In the fine alignment process, an effective computer aided alignment (CAA) method based on the singular valuedecomposition (SVD) of sensitivity matrix is used. Finally, alignment experiment is performed and a WFE of28mλ rms (λ = 632.8nm ) is achieved after fine alignment." @default.
- W2094604249 created "2016-06-24" @default.
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- W2094604249 date "2009-05-11" @default.
- W2094604249 modified "2023-09-23" @default.
- W2094604249 title "Development of a 20X Schwarzschild projection optics for principle experiment of EUV at-wavelength interferometry" @default.
- W2094604249 doi "https://doi.org/10.1117/12.832072" @default.
- W2094604249 hasPublicationYear "2009" @default.
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