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• W2095085909 abstract "The thermal evolution of large boron-interstitials clusters (BICs) in crystalline Si has been studied by transmission electron microscopy (TEM). After ion implantation (20keV and 1×1014Si∕cm2) and annealing (815°C and 5min), large clusters (6–8nm) have been observed in correspondence of a narrow, highly doped Si:B layer (2×1020B∕cm3). Under prolonged annealing, such clusters dissolve, progressively shrinking their mean size below the TEM detection limit. The time evolution of such a BIC shrinking is fully compatible with the slow path dissolution kinetics recently published. These data suggest the identification of the slow dissolving BICs with the large observed clusters." @default.
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• W2095085909 date "2007-07-16" @default.
• W2095085909 modified "2023-10-18" @default.
• W2095085909 title "Evolution of boron-interstitial clusters in crystalline Si studied by transmission electron microscopy" @default.
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• W2095085909 doi "https://doi.org/10.1063/1.2757145" @default.
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