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- W2095291947 abstract "Transition regions at Si-SiO 2 interfaces contain suboxide bonding arrangements which contribute to interface roughness and may give rise to electronically active defects. Interfacial transition regions with suboxide bonding are a direct result of thermal and plasma-assisted oxidation at temperatures up to at least 800°C, but sub-oxide bonding is significantly reduced following a 30 s, 900°C RTA. The kinetics of annealing are essentially the same as those for separation of homogeneous sub-oxide thin films (SiO X , x < 2) into silicon nanocrystals and stoichiometric SiO 2 ." @default.
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- W2095291947 date "1998-01-01" @default.
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- W2095291947 title "Interfacial sub-oxide regions at SiSiO2 interfaces: minimization by post-oxidation rapid thermal anneal" @default.
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- W2095291947 doi "https://doi.org/10.1016/s0169-4332(97)00528-x" @default.
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