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• W2095343760 abstract "Infrared absorption measurements and the temperature dependence of stress have been used to establish the kinetics of structural relaxation and hydrogen evolution from plasma deposited a-SixNy :H films. The Arrhenius rate law describes the dissociation of N–H and Si–H bonds which occurs on annealing the films above 600 °C. The activation energies deduced from the infrared data are lower than the respective bond dissociation energies. The films undergo a rapid stress relaxation in the temperature range 400–650 °C. The discussion of the experimental results highlights possible mechanisms for the evolution of hydrogen from a-SixNy:H networks." @default.
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• W2095343760 date "1988-01-25" @default.
• W2095343760 modified "2023-10-16" @default.
• W2095343760 title "Kinetics of structural relaxation and hydrogen evolution from plasma deposited silicon nitride" @default.
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• W2095343760 doi "https://doi.org/10.1063/1.99495" @default.
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