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• W2095541747 abstract "Hydrogen nanosensor working near room temperature made of porous silicon covered by the TiO 2-x orZnO thin film was realized. Porous silicon layer was formed by electrochemical anodization on a p- and n -typesilicon surface. Thereafter, n -type TiO 2-x and ZnO thin films were deposited onto the porous silicon surface byelectron-beam evaporation and magnetron sputtering, respectively. Platinum catalytic layer and gold electric contactswere for further measurements deposited onto obtained structures by ion-beam sputtering. The sensitivity ofmanufactured structures to 1000-5000 ppm of hydrogen was studied. Results of measurements showed that it is possibleto realize a hydrogen nanosensor which has relatively high sensitivity and selectivity to hydrogen, durability, and shortrecovery and response times. Such a sensor can also be a part of silicon integral circuit and work near roomtemperatures." @default.
• W2095541747 created "2016-06-24" @default.
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• W2095541747 date "2008-04-03" @default.
• W2095541747 modified "2023-09-23" @default.
• W2095541747 title "Porous silicon near room temperature nanosensor covered by TiO 2 or ZnO thin films" @default.
• W2095541747 cites W2016730429 @default.
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• W2095541747 doi "https://doi.org/10.1117/12.777345" @default.
• W2095541747 hasPublicationYear "2008" @default.
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