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- W2095637109 startingPage "L223" @default.
- W2095637109 abstract "A new method is proposed for the determination of the nitrogen (N) concentration in Czochralski silicon by infrared absorption measurement. Two specimens for the determination are cut from the same N-doped Czochralski silicon (wafer). They are subjected to isothermal annealing at 600°C and 750°C for 2 h and quenched in air to hold the quasithermal-equilibrium state in the formation-dissociation reaction of N-related defects. The absorption coefficient of the infrared absorption peak in the differential spectrum between annealed samples is proportional to the total N concentration. The calibration curve between the absorption coefficient and total N concentration is obtained, which is expressed as N/cm3=4.07×1017/cm2 × absorption coefficient of the 963 cm-1 peak." @default.
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- W2095637109 date "2003-03-01" @default.
- W2095637109 modified "2023-10-18" @default.
- W2095637109 title "Technique for Determination of Nitrogen Concentration in Czochralski Silicon by Infrared Absorption Measurement" @default.
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- W2095637109 doi "https://doi.org/10.1143/jjap.42.l223" @default.
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