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- W2096153965 abstract "A defect tolerant method of printing periodic structures with submicron resolution is presented. This technique is based on the self-imaging effect produced when a periodic semi-transparent mask is illuminated with coherent light. An analytical description of the effect, numerical simulations, and experimental evidence that is in good agreement with the theoretical analysis is presented. To explore the extent of defect tolerance, masks with different defect layouts were designed and tested." @default.
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- W2096153965 date "2012-10-09" @default.
- W2096153965 modified "2023-10-16" @default.
- W2096153965 title "Defect tolerant extreme ultraviolet lithography technique" @default.
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- W2096153965 doi "https://doi.org/10.1116/1.4758758" @default.
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