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- W2097260010 abstract "Abstract This paper reports on the first achievement of sub-200nm gate length GaAlAs/GaAs HEMTs produced by x-ray lithography. The chemical amplified SAL601 resist process is optimized with a post-exposure bake (PEB) at 95°C for the replication of very narrow and isolated trenches (gates). The fabricated transistors have gate lengths of 180nm." @default.
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- W2097260010 date "1994-01-01" @default.
- W2097260010 modified "2023-09-24" @default.
- W2097260010 title "180nm gate-length HEMTs using complete x-ray lithography processing" @default.
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- W2097260010 doi "https://doi.org/10.1016/0167-9317(94)90147-3" @default.
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