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- W2097543511 abstract "The current semiconductor business environment requires companies to provide their customers with many chip design options. This drives a large diversification in product and technology mix within a given fabricator, and as the cost of measurement tools, fabricator space, and manpower increases, it becomes critical that each tool is utilized effectively for the situation. An effective way to optimize the utilization and capacity of the photolithography metrology toolset is to implement a plan that allows it to measure less than 100% of the wafers scheduled to move through the area. Metrology capacity utilization is primarily determined by the execution of a sample and skip plan that allows the fabricator to measure less than every wafer and less than every lot. Traditionally, these plans are determined by the technology ground rules of the product and the technology specifications of the photolithography toolset. More stable processes, such as those in older technologies, are allowed higher sampling and skipping rates. The planning process, however, typically does not have a feedback mechanism that allows engineering, planning, and manufacturing to understand the actual execution of those plans. This paper addresses a methodology in place at the IBM Microelectronics facility that assists in analyzing the planned versus actual performance of the sampling and skipping plans. This is done by assessing the overall effects of the sampling and skipping plans, reporting the actual number of lots skipped and measured, and quantifying the time added to the process by oversampling lots. Data are collected directly from the actual lot and tool histories. All of these techniques combined allow for more effective planning and a reduction of the capacity needed for and utilized by the multiple product and technology types run in this fabricator." @default.
- W2097543511 created "2016-06-24" @default.
- W2097543511 creator A5047479789 @default.
- W2097543511 creator A5078903837 @default.
- W2097543511 date "2003-01-20" @default.
- W2097543511 modified "2023-09-24" @default.
- W2097543511 title "A methodology for determining capacity consumption due to the sampling of lots within the photolithography metrology sector in a multi-part number, multi-technology fabricator" @default.
- W2097543511 doi "https://doi.org/10.1109/asmc.1999.798195" @default.
- W2097543511 hasPublicationYear "2003" @default.
- W2097543511 type Work @default.
- W2097543511 sameAs 2097543511 @default.
- W2097543511 citedByCount "3" @default.
- W2097543511 crossrefType "proceedings-article" @default.
- W2097543511 hasAuthorship W2097543511A5047479789 @default.
- W2097543511 hasAuthorship W2097543511A5078903837 @default.
- W2097543511 hasConcept C105795698 @default.
- W2097543511 hasConcept C117671659 @default.
- W2097543511 hasConcept C127413603 @default.
- W2097543511 hasConcept C171250308 @default.
- W2097543511 hasConcept C192562407 @default.
- W2097543511 hasConcept C195766429 @default.
- W2097543511 hasConcept C201995342 @default.
- W2097543511 hasConcept C33923547 @default.
- W2097543511 hasConcept C41008148 @default.
- W2097543511 hasConcept C70388272 @default.
- W2097543511 hasConceptScore W2097543511C105795698 @default.
- W2097543511 hasConceptScore W2097543511C117671659 @default.
- W2097543511 hasConceptScore W2097543511C127413603 @default.
- W2097543511 hasConceptScore W2097543511C171250308 @default.
- W2097543511 hasConceptScore W2097543511C192562407 @default.
- W2097543511 hasConceptScore W2097543511C195766429 @default.
- W2097543511 hasConceptScore W2097543511C201995342 @default.
- W2097543511 hasConceptScore W2097543511C33923547 @default.
- W2097543511 hasConceptScore W2097543511C41008148 @default.
- W2097543511 hasConceptScore W2097543511C70388272 @default.
- W2097543511 hasLocation W20975435111 @default.
- W2097543511 hasOpenAccess W2097543511 @default.
- W2097543511 hasPrimaryLocation W20975435111 @default.
- W2097543511 hasRelatedWork W1523999050 @default.
- W2097543511 hasRelatedWork W1837296482 @default.
- W2097543511 hasRelatedWork W1901425911 @default.
- W2097543511 hasRelatedWork W1948369585 @default.
- W2097543511 hasRelatedWork W1954231020 @default.
- W2097543511 hasRelatedWork W1994626197 @default.
- W2097543511 hasRelatedWork W2017755576 @default.
- W2097543511 hasRelatedWork W2024890063 @default.
- W2097543511 hasRelatedWork W2106485576 @default.
- W2097543511 hasRelatedWork W2118240083 @default.
- W2097543511 hasRelatedWork W2135460220 @default.
- W2097543511 hasRelatedWork W2144499587 @default.
- W2097543511 hasRelatedWork W2163962506 @default.
- W2097543511 hasRelatedWork W2170113805 @default.
- W2097543511 hasRelatedWork W2412851387 @default.
- W2097543511 hasRelatedWork W2541974139 @default.
- W2097543511 hasRelatedWork W2564954811 @default.
- W2097543511 hasRelatedWork W2614035787 @default.
- W2097543511 hasRelatedWork W2620364289 @default.
- W2097543511 hasRelatedWork W2918203057 @default.
- W2097543511 isParatext "false" @default.
- W2097543511 isRetracted "false" @default.
- W2097543511 magId "2097543511" @default.
- W2097543511 workType "article" @default.