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- W2097587645 abstract "Abstract Dielectric breakdown of ferroelectric thin film capacitors is an extremely important phenomenon that in general is not well understood. The importance of dielectric breakdown as it relates to the reliability of devices that utilize these structures can not be over emphasized. Often breakdown voltages are reported as a single value, measured off of a single device. Due to the large variability of thin film dielectric breakdown that is often present even within devices constructed on a single substrate, a statistical investigation is the only meaningful way to present this data. This work details a preliminary statistical investigation into dielectric breakdown of strontium bismuth tantalate thin film capacitors on platinum electrodes. A spin on process was used to deposit the ferroelectric film. Capacitors were fabricated through interconnect metalization. Breakdown voltage as a function of various methods of voltage stressing and temperature stressing is presented. Where possible, theoretical models are used to explain the dielectric breakdown mechanisms." @default.
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- W2097587645 date "1997-02-01" @default.
- W2097587645 modified "2023-09-27" @default.
- W2097587645 title "Statistical investigation of dielectric breakdown of strontium bismuth tantalate thin film capacitors" @default.
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- W2097587645 doi "https://doi.org/10.1080/10584589708015705" @default.
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