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- W2098257027 abstract "This paper presents results that have been obtained from an electron-beam recording system that has been coupled to a large area coverage SEM and used for the inspection of VLSI chips with areas up to 5×5 mm. The recording system is capable of copying 10 000×10 000 picture points over negative areas of 50×50 mm in 50 s. In order to utilize fully the resolution capability of the recording system the SEM must also have a similar performance. To this end and SEM with post-final lens single deflection has been used to generate 10 000×10 000 picture point images of VLSI chips. These images have been copied onto photographic film using the scanning recording system. The advantages of the recording system lie in its ability to copy the images of complete chips with micron and submicron feature sizes directly onto photographic film in a single scan and in the relative ease with which the system can be linked to an SEM." @default.
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- W2098257027 date "1979-11-01" @default.
- W2098257027 modified "2023-09-27" @default.
- W2098257027 title "Inspection of complete VLSI chips with a high resolution image recording system and large area SEM" @default.
- W2098257027 doi "https://doi.org/10.1116/1.570313" @default.
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