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- W2099741908 abstract "Magnetic field enhanced reactive ion etching using SiCl4, combined with a smooth reflowed photoresist masking technique, has been used to fabricate AlGaAs ridge waveguides with extremely smooth sidewalls. The effect of pressure, flowrate and power on etch rate and sidewall smoothness has been studied. Waveguides exhibited optical losses comparable to those obtained using wet etching." @default.
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- W2099741908 date "1993-01-01" @default.
- W2099741908 modified "2023-09-24" @default.
- W2099741908 title "Extremely smooth sidewalls for GaAs/AlGaAs ridge waveguides" @default.
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- W2099741908 doi "https://doi.org/10.1049/el:19930755" @default.
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