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• W2100056607 abstract "Positive tone photoresist function is based upon modulation of the dissolution rate of an acidic polymer in aqueous base developer. During dissolution, a negative surface charge accumulates at the surface of the photoresist film as acidic sites on the polymer are ionized by the basic developer. This negative surface charge causes a depletion of hydroxide ions in the developer solution immediately adjacent to the film. One effect of this phenomenon is to reduce the dissolution rate relative to rates predicted from the bulk base concentration. The depletion of base at the resist/developer interface has been studied through the application of the Poisson–Boltzmann equation and through Monte Carlo simulations. It is shown that the extent of depletion of hydroxide at the surface of the film is related to the bulk developer concentration and the local geometry of the interface. Interfacial geometry is found to be most influential on the length scale of 1–10 nm. When electrostatic effects are considered in conjunction with the equilibrium of the acid–base reaction, the fractional ionization of the surface of the film is significantly lower than previously calculated. Understanding the relationship between the acid–base equilibrium and electrostatic equilibrium represents an important step in our efforts to understand the fundamental dissolution mechanism of positive tone photoresists." @default.
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• W2100056607 date "2002-11-01" @default.
• W2100056607 modified "2023-10-18" @default.
• W2100056607 title "Electrostatic effects during dissolution of positive tone photoresists" @default.
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• W2100056607 doi "https://doi.org/10.1116/1.1521735" @default.
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