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• W2100080364 abstract "V 2 O 5 thin films were produced by pulsed laser deposition (PLD) over a wide temperature range, 30–500 °C. The effects of temperature and structural characteristics of the substrate on the growth, surface morphology, and local atomic structure of V2O5 films were probed with atomic force microscopy (AFM) and Raman spectroscopy (RS). The growth mode and microstructure evolution were strongly dependent on the substrate temperature. The onset of crystallization occurred at 200 °C with an activation energy of 0.43–0.55 eV. Polycrystalline PLD V2O5 films with layered structure exhibited the same local structural symmetry found in crystalline orthorhombic bulk V2O5." @default.
• W2100080364 created "2016-06-24" @default.
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• W2100080364 date "2004-10-28" @default.
• W2100080364 modified "2023-10-10" @default.
• W2100080364 title "Growth and surface characterization of V2O5 thin films made by pulsed-laser deposition" @default.
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• W2100080364 doi "https://doi.org/10.1116/1.1809123" @default.
• W2100080364 hasPublicationYear "2004" @default.
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