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- W2100087945 abstract "We demonstrate the benefit of using a low work-function metal (Yb) to lower the barrier height and hence, the contact resistivity (ρ c ) in unpinned metal-interfacial layer-semiconductor (MIS) contacts on n-type Ge and Si. Metal/doped TiO 2−x /n-Ge and n-Si MIS diodes fabricated with varying TiO 2−x thickness (1–5 nm) exhibit higher (upto 100X) current densities and lower contact barrier heights (upto 30%) for Yb versus Ti metallization. A combination of low work-function Yb, doped TiO 2−x with low conduction band offsets w.r.t Si and Ge, and high substrate doping( n+-Si:2×1020 cm−3 and n+-Ge:2.5×1019 cm−3) is shown to result in ultra-low ρ c values of 2.1×10−8 Ω.cm2 (Si) and 1.4×10−8 Ω.cm2 (Ge) for Yb/TiO 2−x contacts, significantly lower than Ti/TiO 2−x control devices, and the best reported contact resistivity on n-Ge till date." @default.
- W2100087945 created "2016-06-24" @default.
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- W2100087945 date "2015-06-01" @default.
- W2100087945 modified "2023-09-27" @default.
- W2100087945 title "Contact barrier height and resistivity reduction using low work-function metal (Yb)-interfacial layer-semiconductor contacts on n-type Si and Ge" @default.
- W2100087945 doi "https://doi.org/10.1109/drc.2015.7175597" @default.
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