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- W2100558532 abstract "SiGe/Si core/shell nanowire (NW) devices are promising candidates for the future generation MOSFETs providing better channel control and hole mobility. These core-shell devices can be exploited both as p- and n-type devices. The Si shell improves the semiconductor-oxide interface and enhances the device performances. The Germanium condensation technique is able to provide high Ge content (>50%) channel with Si as capping layer. In this work we investigate the viability of using these core/shell NWFETs for CMOS application." @default.
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- W2100558532 date "2009-12-01" @default.
- W2100558532 modified "2023-09-27" @default.
- W2100558532 title "Study of ultra-scaled SiGe/Si core/shell nanowire FETs for CMOS applications" @default.
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- W2100558532 doi "https://doi.org/10.1109/isdrs.2009.5378003" @default.
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